Nikon CFI TU Plan ELWD 100x Reflected Light Objective (NA 0.80, Infinity)The Nikon CFI TU Plan ELWD 100 Reflected Light Objective (NA 0. 80) is an extra long working distance (ELWD) infinity corrected reflected light objective designed for industrial inspection, materials science, and semiconductor applications delivering high resolution 100 reflected light imaging with an exceptional 4. 5mm working distance that provides ample clearance for large, thick, or mounted specimens that cannot be accommodated by standard short
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Nikon CFI TU Plan ELWD 100x Reflected Light Objective (NA 0.80, Infinity)